性能優勢
· Coating deposition carried out using a high density of low energy bombarding ions.
使用高密度低能量轟擊離子進行沉積鍍膜。
· Deposition of very dense, non-columnar coating structures with low internal stresses.
鍍層致密度好，低柱狀晶結構，內應力低
· Deposition of coatings with dense structures at low temperatures.
• 可在低溫環境下沉積致密結構的鍍層
· High efficiency of ion cleaning resulting in coatings with the highest levels of adhesion.
高效率等離子清理以提供高的鍍層結合強度。
· Coatings quality is assured by the use of specially designed Plasmag sputter sources, which create an intense plasma and high ion bombardment of work pieces.
鍍層品質保證是由使用專門設計plasmag濺射源及提供高密度的等離子。
